sputtering system

Brand Name:Zhongda

Place of Origin:Zhaoqing, Guangdong

... are cleaned via ion bombardment and heated.​ 3.Sputtering Process: Argon gas is injected into the chamber; high voltage ionizes argon into plasma. Under the action of a strong magnetic field, plasma ions are accelerated to bombard the sputtering target,

Brand Name:Zhongda

Place of Origin:Zhaoqing, Guangdong

...Sputtering Real Gold Coating Machine Compact magnetron sputtering system designed specifically for applying real gold coatings to stainless steel jewelry with precision and efficiency. Accurate Real Gold Coating Technology Utilizes advanced magnetron sputtering...

Brand Name:Zhongda

Place of Origin:Zhaoqing, Guangdong

...providing the required vacuum environment for magnetron sputtering coating 2.Magnetron sputtering system : Including magnetron sputtering cathodes, targets, etc. 3.Automatic Control System : Fully automatic process control by computer or PLC control...

Brand Name:Zhongda

Place of Origin:Zhaoqing, Guangdong

...Sputtering Coating Equipment Professional PVD vacuum coating machine designed for coating glasses, metals, and various substrates with precision thin films. Core Technology Introduction RF magnetron sputtering coating equipment utilizes magnetron sputtering...

Brand Name:Zhongda

Place of Origin:Zhaoqing, Guangdong

...sputtering coating equipment, integrating magnetron sputtering and ion plating technologies, is suitable for the preparation of films on metals, alloys, compounds, etc. Core technical features High deposition rate ‌ : By using high-speed magnetron electrodes, the ion current is large, significantly enhancing the deposition rate and sputtering...

Brand Name:Zhongda

Place of Origin:Zhaoqing, Guangdong

Introduction PRODUCT PRESENTATION A magnetron sputtering coater is a device based on magnetron sputtering technology. It uses magnetic field constrained ions to bombard targets, depositing uniform, dense films on substrates. Why it's good: It is known for ...

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...

Brand Name:ROYAL

Model Number:RTSP1213-DC

Place of Origin:Made in China

SiC Fuel Cell Module PECVD Sputtering System / Hydrogen Fuel Cell Magnetron Sputtering Coating Equipment SiC Fuel Cell Module Sputtering System Specifications MODEL RTSP1213-DC MATERIAL Stainless Steel (S304) CHAMBER SIZE Φ1250 * 1350mm (H) CHAMBER TYPE ...

Brand Name:ROYAL

Model Number:RTSP800

Place of Origin:Made in China

... microscope slide, Transparent shielding glass, conducting glass, defrosting film, De-icing film coating, ITO Glass PVD Sputtering Coating Plant Technical Configurations: 1) DC Sputtering Sources: Cu, Al,

Brand Name:ROYAL

Model Number:RTES1600

Place of Origin:MADE IN CHINA

... and sputtering deposition sources, vacuum coating chamber , vacuum pumping system, deposition system, cooling system , electrical control system , workpiece rotating rack. Thermal Evaporation and Sputtering Metalizing Machine Features: Dual chamber for

Brand Name:ROYAL

Model Number:RTAC-SP

Place of Origin:Made in China

Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets Au Gold Magnetron Sputtering on Silicon Wafers Summary: With PVD DC sputtering technology can deposit Au Gold metal thin film on glass slides, silicon wafers...

Brand Name:ROYAL

Model Number:RTAS1215

Place of Origin:Made in China

...Sputtering Depostion System, Aluminum Nitride PVD Copper Sputtering Machine Performance 1. Ultimate Vacuum Pressure: better than 5.0×10-6 Torr. 2. Operating Vacuum Pressure: 1.0×10-4 Torr. 3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber) 4. Metalizing material (sputtering...

Brand Name:ROYAL

Model Number:RTAS1215

Place of Origin:Made in China

...Sputtering Coating Plant Cooper Magnetron Sputtering Coating Plant on Ceramic Radiating Substrate The DPC process- Direct Plating Copper is an advanced coating technology applied with LED / semiconductor / electronic industries. One typical application is Ceramic Radiating Substrate. Cooper conductive film deposition on Al2O3, AlN, Si, Glass substrates by PVD vacuum sputtering

Brand Name:ROYAL

Model Number:DPC1215+

Place of Origin:Made in China

Cooper Magnetron Sputtering Coating Plant on Semiconductor equipment / Ceramic Chips Directly Plating Copper Sputtering Equipment Cooper Magnetron Sputtering Coating Plant on Ceramic Radiating Substrate The DPC process- Direct Plating Copper is an advanced...

Brand Name:ROYAL

Model Number:RTAC-SP

Place of Origin:Made in China

... the surface with PVD vacuum coating technology to generate various colors: black, rainbow, gold, copper, brown etc. Sputter Deposition Sputtering is a metal deposition process where the target material is not vaporized using heat, but its metal atoms are

Brand Name:JXS

Place of Origin:China

...Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered...

Brand Name:JINXING

Model Number:Chromium Tube Sputtering Target

Place of Origin:China

...Sputtering Target Chromium tube sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/cm3. Soluble in strong alkali solution. Chromium has a high corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal Description Chromium Tube Sputtering...

Brand Name:JINXING

Model Number:Chromium Plate Sputtering Target

Place of Origin:China

... corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal Description Chromium Sputtering Target,

Brand Name:JINXING

Model Number:Aluminum Titanium Sputtering Target

Place of Origin:China

...perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, alloy and intermediate alloy targets, ceramic targets) to colleges and universities, scientific research ...