semiconductor substrate

Brand Name:ZMSH

Model Number:InP wafer

Place of Origin:China

..., semiconductor wafer, InP Laser Epitaxial Wafer Features of InP Laser Epitaxial Wafer - use InP wafers to manufacture - support ...

Brand Name:ZMSH

Model Number:GaAs wafer

Place of Origin:China

..., semiconductor wafer, Gallium Arsenide Laser Epitaxial Wafer Features of GaAs Laser Epitaxial Wafer - use GaAs wafers to manufacture - ...

Brand Name:ZMSH

Model Number:InAs wafer

Place of Origin:China

... Wafer InAs Epitaxial Wafer for LD Laser Diode, semiconductor epitaxial wafer, 3inch InAs-Zn wafer, InAs single crystal wafer ​2inch 3inch 4inch InAs-Zn substrates for LD application, semiconductor wafer, Indium Arsenide Laser Epitaxial Wafer Features...

Brand Name:CESGATE

Model Number:NA

Place of Origin:China

...substrate material is mainly epoxy glass fiber cloth. The main uses are personal computers, medical electronic equipment, measuring instruments, semiconductor testing machines, numerical control machines, electronic switches, communication machines, memory circuit boards, IC cards, etc. (B) 6-8 layer board The substrate...

Brand Name:Forged

Model Number:customized

Place of Origin:Luoyang Henan, China

..., low coefficient of thermal expansion and high coefficient of thermal conductivity. For example, we use this material to produce strips for industrial lighting, semiconductor substrates for power electronics, glass melting electrodes,

Brand Name:ROYAL

Model Number:DPC1215

Place of Origin:Made in China

... applied with LED / semiconductor / electronic industries. One typical application is Ceramic Radiating Substrate. Cooper conductive film deposition on Aluminum Oxide (Al2O3), AlN substrates by PVD vacuum sputtering technology, compared with traditional

Brand Name:ROYAL

Model Number:RTAC1215-SP

Place of Origin:Made in China

... / electronic industries. One typical application is Ceramic Radiating Substrate. Cooper conductive film deposition on Al2O3, AlN, Si, Glass substrates by PVD vacuum sputtering technology, compared with traditional manufacturing methods: DBC LTCC HTCC,

Brand Name:ROYAL

Model Number:DPC1215

Place of Origin:Made in China

...- Direct Plating Copper is an advanced coating technology applied with LED / semiconductor / electronic industries. One typical application is Ceramic Radiating Substrate. Cooper conductive film deposition on Al2O3, AlN, Si, Glass substrates by PVD vacuum

Brand Name:JINXING

Model Number:Tungsten Sputtering Target

Place of Origin:China

...substrate for the tungsten oxide film to realize its functional transition in the semiconductor device. Due to the high melting point of tungsten, tungsten targets are mainly prepared by powder metallurgy Description The tungsten sputtering target is an important substrate...

Brand Name:ROYAL

Model Number:RTSP

Place of Origin:Made in China

... is Ceramic Radiating Substrate. Silver / Copper conductive film deposition on Aluminum Oxide (Al2O3), AlN substrates by PVD vacuum sputtering technology, has above all one big advantage compared to traditional manufacturing methods: DBC LTCC HTCC,

Brand Name:ROYAL

Model Number:DPC1215

Place of Origin:Made in China

...- Direct Plating Copper is an advanced coating technology applied with LED / semiconductor / electronic industries. One typical application is Ceramic Radiating Substrate. Cooper conductive film deposition on Al2O3, AlN, Si, Glass substrates by PVD vacuum

Brand Name:ROYAL

Model Number:RTSP

Place of Origin:Made in China

... is Ceramic Radiating Substrate. Silver / Copper conductive film deposition on Aluminum Oxide (Al2O3), AlN substrates by PVD vacuum sputtering technology, has above all one big advantage compared to traditional manufacturing methods: DBC LTCC HTCC,

Brand Name:FUNSONIC

Model Number:FSW-4002-L

Place of Origin:CHINA

...Semiconductor Chip Calcium Titanate Solar Cell Description: Scattering nozzles use low-pressure air/gas to generate uniform and wide spray patterns, with each nozzle reaching a maximum of 9.8 inches (25 centimeters) depending on the distance from the substrate. The speed of the air flow is controllable to allow low or high impact of the atomized spray on the product or substrate...

Brand Name:ROYAL

Model Number:RTSP

Place of Origin:Made in China

... is Ceramic Radiating Substrate. Silver / Copper conductive film deposition on Aluminum Oxide (Al2O3), AlN substrates by PVD vacuum sputtering technology, has above all one big advantage compared to traditional manufacturing methods: DBC LTCC HTCC,

Brand Name:ZG

Model Number:MS

Place of Origin:China

...best material choice for sintering AIN substrate. The sintered AIN substrate has ultra-high thermal conductivity, high electrical insulation and thermal expansion properties similar to those of semiconductor materials such as silicon wafer. It is widely...

Brand Name:ZG

Model Number:MS

Place of Origin:China

...best material choice for sintering AIN substrate. The sintered AIN substrate has ultra-high thermal conductivity, high electrical insulation and thermal expansion properties similar to those of semiconductor materials such as silicon wafer. It is widely...

Brand Name:Crystro

Model Number:CR201204-01

Place of Origin:China

Polished surface Si silicon single crystal Black amorphous silicon is obtained by the reduction of sand (SiO2) with carbon. Ultra-pure crystals if silicon have a blue-grey metallic sheen. Bulk silicon is un-reactive towards oxygen, water and acids (except ...

Brand Name:OEM/High Broad

Model Number:Armor Ceramic

Place of Origin:China

..., and composite reinforcements. Single-crystal products are as used as compounds in semiconductor substrates for high-temperature applications. Silicon carbide ceramics are also used in: Ceramic armor protection systems High temperature bearings Electric

Brand Name:OEM/High Broad

Model Number:Armor Ceramic

Place of Origin:China

..., abrasives, and composite reinforcements. Single-crystal products are as used as compounds in semiconductor substrates for high-temperature applications. Silicon carbide ceramics are also used in: Ceramic armor protection systems High temperature bearings

Brand Name:Uchi

Model Number:MBR20100

Place of Origin:Dongguan China

... substrate, on which an N-epitaxial layer with arsenic as a dopant is formed. The anode uses materials such as molybdenum or aluminum to make the barrier layer. Silicon dioxide (...