Frosting Silicon Dioxide Sputtering Target 1100Mpa High Corrosion Resistance
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Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (......
Yantai ZK Optics Co., Ltd.
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Aluminum Silicon Alsi Sputtering Targets 90:10 / 80:20 At% Evaporation Material
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...Silicon Sputtering Target (AlSi) alloy 90:10/ 80:20 at% After the development of sputtering coating technology in recent years, the coating technology for various materials has been very perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, alloy and intermediate alloy targets, ceramic targets......
JINXING MATECH CO LTD
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Titanium Target Silicon Sputtering Target Gr5 Gr7 Pvd Coating Machine For PVD Vacuum Coating Machine
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...our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Silicon Dioxide granule 0.5-3mm,1-3mm,2-4mm,3~5mm ; Φ2x2mm ; Φ3x3mm; Φ25 or customer requirement size (SiO2 granule)
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SiO2 granule 0.5-3mm 1-3mm 2-4mm or customization 99.99% Chemical name: SiO2 Boiling point: 2230℃ Purity: 4N Specification: 1-4mm, particle, target Molecular weight: 60.08 Appearance: white Melting point: 1700℃ Density: 2.2-2.7g/cm3 In 10-4Torr vacuum ......
Chongqing Newsin Technology Co., Ltd
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Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets
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...deposit Au Gold metal thin film on glass slides, silicon wafers. Except Au gold deposition, other metal targets also available: Silver (Ag), Copper (Cu), Aluminum (Al), Chrome (Cr), Stainless Steel (SS316L), Titanium (Ti) to obtain either ......
SHANGHAI ROYAL TECHNOLOGY INC.
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Fine Uniform Thickness Film 3C Electronic Components Vacuum PVD Magnetron Sputtering Coating Equipment
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...Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target......
Foshan Jinxinsheng Vacuum Equipment Co., Ltd.
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Metal And Non Metal Surface Indium Coating Machine 20Khz Target Welding Machine
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...Target Welding Machine 20Khz Metal and Non Metal Surface Coating Indium Technology Description: Indium coating machine, also known as target welding machine, is a traditional technique for manually coating indium on metal and non-metal surfaces such as copper plates, ITO glass, and silicon dioxide......
Hangzhou Qianrong Automation Equipment Co.,Ltd
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Hard armor Bulletproof Plates Silicon carbide Boron carbide Ceramic independent protection
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NIJ IV Hard armor Bulletproof Plates Silicon carbide Boron carbide Ceramic independent protection Boron Carbide Tile Uses: Systems, semiconductor components, sputtering targets industrial wear components, boron carbide tiles are used in police and military......
China Hunan High Broad New Material Co.Ltd
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M-19 Oriented Electrical Steel 0.35mm Cold Rolled Grain Oriented Steel
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...Chinese government has announced an action target to control greenhouse gas emissions by 2020: by 2020, China will reduce carbon dioxide emissions per unit of GDP (gross domestic product) by 40 to 45 percent from the 2005 level, which will be included as a...
Wuxi Zhongxin Special Steel Co.，Ltd
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